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1973. Cobalt polishing with reduced galvanic corrosion at copper/cobalt interface using hydrogen peroxide as an oxidizer in colloidal silica-based slurries. BC Peethala, HP Amanapu, URK Lagudu, SV...
Hydroxyl Radical Formation in H 2 O 2‐Amino Acid Mixtures and Chemical Mechanical Polishing of Copper. M Hariharaputhiran, J Zhang, S Ramarajan, JJ Keleher, Y Li, SV Babu. Journal of the...
S. V. Babu's 205 research works with 4,648 citations and 34,410 reads, including: Perspective—Recent Advances and Thoughts on Ceria Particle Applications in Chemical Mechanical...
Real-Time Visualization of the Cleaning of Ceria Particles from Silicon Dioxide Films Using PVA Brush Scrubbing. ECS Journal of Solid State Science and Technology. 2021-08-01 | Journal article. DOI: 10.1149/2162-8777/ac1c55.
Nov 1, 2004 · CMP removal rate of silicon nitride (lower) and silicon oxide (top) as a function of the amino acid pI. The amino acids are (a) glycine, (b) alanine, (c) proline, (d) lysine, and (e) arginine. Both the silicon nitride and silicon oxide removal are suppressed by the amino acids arginine and lysine.
- William G. America, S. V. Babu
- 2004
Jul 15, 2024 · S.V. Babu, Clarkson University Professor Emeritus in the Department of Chemical and Biomolecular Engineering and former Director of the Center for Advanced Materials Processing (CAMP) at Clarkson University was recently honored and celebrated for his immense contributions to the development of the chemical-mechanical planarization ...
Contact Email: sbabu@clarkson.edu Office Phone Number: 315/268-4167 Office Location: 220 CAMP Building
