Search results
Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H 2 SO 4) and hydrogen peroxide (H 2 O 2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers . [1]
May 4, 2020 · Piranha solution is an aqueous mixture of sulfuric acid (H 2 SO 4) and hydrogen peroxide (H 2 O 2) that removes organic residue from surfaces and makes them more hydrophilic. It is also known as piranha etch because another common use is etching circuit boards.
Jun 4, 2020 · Learn how to make, use, and dispose of chemical piranha solution, a potent acid and peroxide solution used to clean glassware and other surfaces.
Overview. Piranha solutions are used to remove organic residues from substrates, particularly in microfabrication labs. The traditional piranha solution is a 3:1 mixture of sulfuric acid and 30% hydrogen peroxide. The solution may be mixed before application or directly applied to the material, applying the sulfuric acid, followed by the peroxide.
Piranha solution is a dangerous and useful substance used throughout academia and industry. However, there is little peer-reviewed work on its safe use, and institutional protocols are limited in their applicability beyond their institute of origin.
Piranha solutions are used to remove organic residues from substrates, particularly in microfabrication labs. The traditional piranha solution is a 3:1 mixture of sulfuric acid and 30% hydrogen peroxide. The solution may be mixed before application or directly applied to the material, applying the sulfuric acid, followed by the peroxide.
Piranha solutions are strong oxidizers used to remove organic residues from substrates. As such, piranha solutions are extremely corrosive, reactive, and potentially explosive. Most commonly used is the acid piranha, typically a 3:1 Sulfuric Acid (H2SO4) and Hydrogen Peroxide (H2O2).
